Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector
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چکیده
Electrochemically Enhanced Wet Cleaning of Ru Capping Thin Film for EUV Lithography Reflector Hyungtak Seo, Jeong Y. Park, Ted Liang, and Gabor A. Somorjai Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA Department of Chemistry, University of California, Berkeley, California 94720, USA Intel Corporation, Components Research, Technology, and Manufacturing Group, Santa Clara, California 95054, USA
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